Effects of Deposition Method of PECVD Silicon Nitride as

Effects of Deposition Method of PECVD Silicon Nitride as - Experimental The deposition of silicon nitride Si 3N 4 films used as the capacitor insulator or dielectric in a metalinsulatormetal MIM was performed

This eBook was ranked 11 by Bing.com for keyword novellus.

EBOOK META DATA

TITLE:	Effects of Deposition Method of PECVD Silicon Nitride as
PDF URL:	http://www.skyworksinc.com/downloads/press_room/published_articles/ECS_052011.pdf
SOURCE DOMAIN:	www.skyworksinc.com